Ringkasan Berita: Panduan keselamatan mendaki menekankan penggunaan prinsip S.T.O.P (Sit, Think, Observe, Plan) sebagai ...
Abstract: The blanket boron implant (BBI) in the sigma-shaped trench before the embedded SiGe (eSiGe) source/drain (S/D) formation for 28-nm PMOSFET is proposed in this letter. It is demonstrated that ...