New research paper titled “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” from researchers at Fraunhofer-Institut für Integrierte Systeme und ...
Numerical Technologies is trying to take its phase-shift mask technology out of just making shorter gates and into the interconnect layers of chips as the chipmakers try to push 193nm equipment deeper ...
SANTA CLARA, Calif. — In a move to develop next-generation devices based on current lithography platforms, Intel Corp. here today announced a major cross-licensing agreement with Numerical ...
Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...
Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...
A panel representing all aspects of the lithographic ecosystem talked about the future of EUV lithography on February 28th, during the SPIE Advanced Lithography + Patterning conference, in San Jose, ...
At last month's SPIE Advanced Lithography + Patterning Conference, Belgian electronics research center imec presented the latest results from its Joint High-NA Lab and the patterning ecosystem around ...
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